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Fraunhofer-IFAM

Atmospheric Pressure Plasma Technology

 

Process Development
   
Atmospheric-pressure plasma device

  • facilitates activation, cleaning and coating,
  • can be installed as a continuing inline-process, as no vacuum device is required; therefore high treatment speed can be reached,
  • facilitates treating marked areas.

In addition to a laboratory device, a device for treating batch- and web material is available (0,3 m treatment width, 400 m/min treatment speed).

further Information

Functional surfaces Thin film deposition (PDF)
Cleaning - Activation (PDF)
Process Development (PDF)
Video: Demo AD-Plasma (8,2 MB MPEG)

Figure captions:

Atmospheric-pressure plasma device

Contact

Dr. Jörg Ihde
Phone +49 421 2246-427
Fax +49 421 2246-430
joerg.ihdeifam.fraunhofer.de

Dr. Ralph Wilken
Phone +49 421 2246-448
Fax +49 421 2246-77-448
ralph.wilkenifam.fraunhofer.de

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10.2008